Deep Oxidation of Aluminum by a DC Oxygen Plasma
نویسندگان
چکیده
Resumen A novel way to obtain aluminum oxidation using a DC oxygen plasma is described. It is shown that the alumina layer is 50 nm thick and the oxidation results in a stochiometric formation of Al2O3. The influence on the oxidation of the electrode distance and pressure are studied. By analysing the experimental data, we find that the kinematics of oxide growth can be described as having two main contributions coming from the plasma and the surrounding ionized gas.
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تاریخ انتشار 2008